Heidelberg Instruments and SwissLitho AG joined forces in early 2018. Together, they offer the widest range of direct write micro- and nanolithography systems in the world, from low-cost desktop solutions to high-end writers for substrates larger than 1m. Their products are used for prototyping in R&D, industrial manufacturing, and academic research. A full wafer can be patterned in a few minutes with sub-micron resolution, making mask aligners obsolete. Single-nm resolution with simultaneous pattern inspection is achieved with the unique NanoFrazor technology. Systems from both companies can be used to obtain micro- and nanostructures with high aspect ratio as well as in grayscale mode, which makes them particularly suitable to create templates for NIL applications.